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Home Research [J.17] Critical Dimension and Pattern Size Enhancement Using Pre-Strained Lithography

[J.17] Critical Dimension and Pattern Size Enhancement Using Pre-Strained Lithography

Research / Device Development 元件開發
[J.17] Critical Dimension and Pattern Size Enhancement Using Pre-Strained Lithography
Research / Device Development 元件開發

[J.17] Critical Dimension and Pattern Size Enhancement Using Pre-Strained Lithography

Jian-Wei Hong, Chung-Yuan Yang, and Cheng-Yao Lo
Applied Physics Letters, Vol. 105, 154103 (2014)

doi:10.1063/1.4898572

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