[J.16] Enlarging a Post-Lithography Pattern Modification Process Window with a Poisson’s Ratio-Matching Inter-Layer

[J.16] Enlarging a Post-Lithography Pattern Modification Process Window with a Poisson’s Ratio-Matching Inter-Layer

En-Chiang Chang, Michal Stach,Chung-Yuan Yang, Chien-Chung Fu, and Cheng-Yao Lo
Microelectronic Engineering, Vol. 127, pp. 97-101 (2014)

doi:10.1016/j.mee.2014.05.024